COLD-PRESSED SPUTTER TARGETS

United States of America Patent

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Issued Date
Nov 12, 2009
app pub date
May 30, 2007
filing date
Jun 1, 2006

priority date (Note)
Abandoned

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Abstract

A sputter target includes a sputter material made of an alloy or a material mixture composed of at least two components which are in a state of thermodynamic disequilibrium. The components are compacted by an isostatic or uniaxial cold-pressing process.

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Patent Owner(s)

Patent Owner	Address
W C HERAEUS GMBH	HANAU HANAU HESSIAN

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Schultheis, Markus	Flieden , DE	15	77
Weigert, Martin	Hanau , DE	49	589

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COLD-PRESSED SPUTTER TARGETS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12296462

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12296462

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Abstract

First Claim

Family

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