Method for producing high-purity nickel
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United States of America Patent
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Issued Date -
Nov 5, 2009
app pub date -
Apr 13, 2005
filing date -
Jul 28, 2004
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Abandoned
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Abstract
A method for producing high-purity nickel, which involves using a hydrochloric acid solution system to electro-deposit high-purity nickel, characterized in that, it includes the following steps sequentially: 3N-grade-grade electrolytic nickel was used as anode and the electro-deposition was carried out in a hydrochloric acid system, the solution obtained from the electro-deposition was extracted by a three-level countercurrent extraction using anion extraction solvents, and then back-extracted and degreased. After that, the solution was passed through the anion exchange resin to be further purified by ion exchange, and finally put into the electrolytic cell to deposit nickel. The amount of the solution that was put into the cell and the amount of the solution that was drawn out of the cell after the electro-deposition was the same? After the glow discharge analysis by a mass spectrography, the high-purity nickel obtained by the method according to the present invention was the 5N-grade-grade high-purity nickel. The cost was low and the contamination was prevented.
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