PLASMA GENERATING DEVICE AND FILM DEPOSITION METHOD IN WHICH THE PLASMA GENERATING DEVICE IS USED
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United States of America Patent
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Issued Date -
Oct 29, 2009
app pub date -
Jul 31, 2006
filing date -
Aug 2, 2005
priority date (Note) -
Abandoned
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Abstract
Problem: To generate long plasma easily at low cost and to perform a plurality of film deposition methods using a single plasma generating device.Means for Solving the Problem A plasma generating device is provided with, in the vacuum inside thereof, a cylindrical electrode comprising an opening in a part thereof and generating plasma therein when gas is introduced thereinto and a direct-current negative voltage is applied thereto.
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