DOUBLE EXPOSURE LITHOGRAPHY USING LOW TEMPERATURE OXIDE AND UV CURE PROCESS
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United States of America Patent
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Issued Date -
Oct 8, 2009
app pub date -
Mar 31, 2009
filing date -
Apr 7, 2008
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Abandoned
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Abstract
A method of processing a substrate includes forming a first layer having a photosensitive response to incident radiation on the substrate, forming a first pattern in the first layer, and exposing the first pattern to ultra-violet radiation. The exposure of the first pattern to ultra-violet radiation increases the resistance of the first pattern to a developer. The method also includes forming a conformal protective layer over the first pattern and at least a portion of the substrate. The method further includes forming a second layer having a photosensitive response to incident radiation over the conformal protective layer and forming a second pattern in the second layer.
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