PROCESSING CHAMBER
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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Issued Date -
Oct 8, 2009
app pub date -
Mar 24, 2009
filing date -
Mar 25, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A process apparatus for treatment of a substrate comprising a load chamber for loading the substrate, a process chamber for processing the substrate, a sealing plane separating the process chamber from the load chamber and means for vertically moving the substrate from the load chamber to the process chamber, and a method for treating the substrate are provided. The load chamber is located in one of the lower and upper portions of the process apparatus, and the process chamber is located in the other of the lower and upper portions of the process apparatus. The process apparatus and method of the present invention will provide easy maintenance and reduced costs by reducing the number of movements for loading the substrate.
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