System and methods for filtering out-of-band radiation in EUV exposure tools
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United States of America Patent
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Issued Date -
Oct 8, 2009
app pub date -
Mar 31, 2009
filing date -
Apr 2, 2008
priority date (Note) -
Abandoned
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Abstract
In a first aspect, an apparatus for exposing a substrate with EUV radiation is described herein which may comprise a target material; a laser source generating a laser beam having a wavelength, λ, for irradiating the target material to generate EUV radiation, the laser beam defining a primary polarization direction; at least one mirror reflecting the EUV radiation along a path to the substrate; and a polarization filter disposed along the path filtering at least a portion of light having the wavelength, λ.
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