METHOD FOR ACTIVATING REACTIVE OXYGEN SPECIES FOR CLEANING CARBON-BASED FILM DEPOSITION
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United States of America Patent
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Issued Date -
Oct 1, 2009
app pub date -
Mar 28, 2008
filing date -
Mar 28, 2008
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Abandoned
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Abstract
A method of continuously forming carbon-based films on substrates includes: (i) forming a carbon-based film on a substrate in a reactor a pre-selected number of times; (ii) exciting an inert gas, an oxygen gas, and a nitrogen tri-fluoride gas to generate a plasma for cleaning; (iii) cleaning an inside of the reactor with the plasma after step (i) to remove particles accumulated during step (i) on the inside of the reactor.
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