Analysis of fluoride at low concentrations in acidic processing solutions
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United States of America Patent
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Issued Date -
Sep 17, 2009
app pub date -
Mar 14, 2008
filing date -
Mar 14, 2008
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Abandoned
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Abstract
Low concentrations of fluoride ion in a semiconductor processing solution containing an acid are determined via fluoride ion specific electrode measurements corrected for the effect of the acid concentration. No reagents are used for the fluoride determination.
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