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Abstract

The present invention aims to provide a sintered body and a component used in a plasma processing apparatus. The sintered body and the component are mainly composed of a cerium oxide, which is excellent in corrosion resistance to halogen-based gas or plasma, and can reduce resistance. The cerium oxide can also suppress contamination of metal due to impurity caused by the constituent material of the ceramic even in a halogen plasma process, so that it can preferably be used, as a substitute of an yttria, for a component in a plasma processing apparatus for manufacturing a semiconductor or liquid crystal.A sintered body is used, wherein at least the portion exposed to plasma is formed by adding an yttria with a purity of 99% or more in an amount of 3 parts by weight or more and 100 parts by weight or less to 100 parts by weight of a cerium oxide having purity of 99% or more. Alternatively, a component covered by a sprayed film having the composition same as described above is used. Alternatively, a sintered body that is formed by adding a lanthanum oxide with a purity of 99% or more to a cerium oxide with a purity of 99% or more in an amount of 1 to 50 mol % in the total composition is used, wherein the surface roughness Ra of the portion at least exposed to plasma is less than 1.6 μm.

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First Claim