Laser Heated Discharge Plasma EUV Source With Plasma Assisted Lithium Reflux
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United States of America Patent
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Issued Date -
Sep 10, 2009
app pub date -
Feb 20, 2009
filing date -
Feb 21, 2008
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Abandoned
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Abstract
A self-magnetically confined lithium plasma that has an applied axial magnetic field is irradiated at sub-critical density by a perpendicularly oriented carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size. Lithium reflux is facilitated by ionization, electric field induced drift toward, and capture on surfaces intersected perpendicularly by the applied axial magnetic field.
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