Dyed photoresists and methods and articles of manufacture comprising same
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United States of America Patent
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app pub date -
Dec 12, 2008
filing date -
Oct 7, 1996
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Abandoned
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Abstract
The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
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