METHOD FOR PRODUCING METAL NITRIDE FILM, OXIDE FILM, METAL CARBIDE FILM OR COMPOSITE FILM OF THEM, AND PRODUCTION APPARATUS THEREFOR
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United States of America Patent
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Issued Date -
Aug 13, 2009
app pub date -
Jun 22, 2007
filing date -
Jun 22, 2006
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Abandoned
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Abstract
Disclosed is a method for producing a film selected from the group consisting of a metal nitride film, a metal oxide film, a metal carbide film and a film of composite material thereof. The method for producing a film comprises a first step wherein a metal film is formed on a substrate by physical vapor deposition, and a second step wherein a radical, which is produced by bringing a raw material gas containing an atom selected from the group consisting of a nitrogen atom, an oxygen atom and a carbon atom into contact with a metal catalyst, is reacted with the metal film. This method for producing a film enables to form a thin metal nitride film or the like having low resistance by easily causing a radical reaction even without heating or heating at low temperatures, since the metal film is formed by physical vapor deposition without using a chemical reaction, and then an energetically activated radial is reacted with the metal film.
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