METHOD FOR DESCRIBING A RETARDATION DISTRIBUTION IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
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app pub date -
Apr 10, 2009
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Jan 5, 2005
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Abstract
In a method for describing a retardation distribution of a light bundle emerging from a selected field point, which passes through a birefringent optical element contained in an optical system of a microlithographic projection exposure apparatus, a distribution of retardation vectors is determined so that precisely one direction of a retardation vector is allocated to each directionless orientation of the retardation. The retardation vector distribution is then at least approximately described as a linear superposition of predetermined vector modes with scalar superposition coefficients.
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