RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING COPOLYMER

United States of America Patent

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Issued Date
Jul 23, 2009
app pub date
Jan 5, 2009
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Jan 23, 2008

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Abandoned

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Abstract

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groups contains a fluorine atom.

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TOKYO OHKA KOGYO CO LTD	KANAGAWA

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Inventor Name	Address	# of filed Patents	Total Citations
Dazai, Takahiro	Kawasaki-shi , JP	73	876
Furuya, Sanae	Kawasaki-shi , JP	12	286
Hirano, Tomoyuki	Kawasaki-shi , JP	119	1838
Mori, Takayoshi	Kawasaki-shi , JP	50	396
Shiono, Daiju	Kawasaki-shi , JP	71	860

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RESIST COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING COPOLYMER

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12348780

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12348780

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