LASER ADJUSTABLE DEPTH MARK SYSTEM AND METHOD
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United States of America Patent
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app pub date -
Jan 15, 2008
filing date -
Jan 14, 2008
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Abandoned
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Abstract
A system and method for adjustable laser mark depth is provided. In one embodiment, the system is used in Nd—YAG laser marker for wafer processing in the semiconductor industry, with smart control of the mark depth and expanded work range between the deep mark and the light mark.
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