EFFLUENT GAS RECOVERY PROCESS FOR SILICON PRODUCTION
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United States of America Patent
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Issued Date -
Jul 2, 2009
app pub date -
Dec 31, 2007
filing date -
Dec 31, 2007
priority date (Note) -
Abandoned
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Abstract
Effluent gas from a polysilicon reactor is directed to a gas separation membrane with a permeate gas being recycled to the reactor and the retentate being chilled with a cryogenic condenser using liquid cryogen. Liquid cryogen vaporized by the hot effluent gas may be stored or used to seal and/or chill the reactor or blanket a Si feed to a SiHCl3 reactor.
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