METHOD OF MANUFACTURING SUPERCONDUCTING THIN FILM MATERIAL, SUPERCONDUCTING DEVICE AND SUPERCONDUCTING THIN FILM MATERIAL

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United States of America Patent

APP PUB NO 20090149330A1
SERIAL NO

12278352

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Abstract

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A method of manufacturing a superconducting thin film material includes the step of forming an intermediate layer, the step of forming one superconducting layer to be in contact with the intermediate layer and the step of forming another superconducting layer by a vapor phase method to be in contact with the one superconducting layer. Between the step of forming the intermediate layer and the step of forming the one superconducting layer, the intermediate layer is kept in a reduced water vapor ambient or reduced carbon dioxide ambient or, between the step of forming one superconducting layer and the step of forming another superconducting layer, the one superconducting layer is kept in a reduced water vapor ambient or reduced carbon dioxide ambient. Thus, the critical current value can be improved.

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO ELECTRIC INDUSTRIES LTD5-33 KITAHAMA 4-CHOME CHUO-KU OSAKA-SHI OSAKA 5410041 JAPAN
INTERNATIONAL SUPERCONDUCTIVITY TECHNOLOGY CENTER THE JURIDICAL FOUNDATIONTOKYO 105-0004

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hahakura, Shuji Osaka , JP 21 92
Hasegawa, Katsuya Osaka , JP 14 71
Ohmatsu, Kazuya Osaka , JP 32 190
Ueyama, Munetsugu Osaka , JP 30 80

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