Apparatus and method for supporting a substrate at a position with high precision
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United States of America Patent
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Issued Date -
May 21, 2009
app pub date -
Sep 30, 2008
filing date -
Nov 15, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
An apparatus and a method are disclosed for supporting a substrate at a position with high precision. The substrate is placed on a stage which is configured to be traversable in a plane in two spatial directions oriented perpendicular to each other. The substrate is supported on three point-like support elements. At least one of the support elements is configured to be moveable in the plane.
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