Apparatus and Method for Wafer Edge Exclusion Measurement
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United States of America Patent
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app pub date -
Aug 8, 2008
filing date -
May 2, 2006
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Abstract
A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. An automatic defect characterization processor is provided.
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