PATTERNED ELECTRODES WITH REDUCED RESIDUE
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United States of America Patent
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Issued Date -
May 14, 2009
app pub date -
Oct 7, 2008
filing date -
Nov 9, 2007
priority date (Note) -
Abandoned
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Abstract
Aspects of the present invention provide patterned electrodes with substantially reduced or removed residue. Aspects of the present invention for removing residue are applicable to any fabricated structure including transparent electrodes. By substantially reducing or removing residue typically associated with methods used to form patterned electrodes, an improvement in performance can be realized by ensuring that the deposition of subsequent materials onto a substrate is not adversely affected by any such residue. In turn, better interconnects can be formed and better coverage of subsequent layers can be achieved. The method for producing patterned electrodes with substantially reduced or removed residue in accordance with the present invention can be used in conjunction with any known method for patterning conductors or electrodes.
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