HIGH DEFINITION LITHO APPLIQUE AND EMBLEMS
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United States of America Patent
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Issued Date -
May 14, 2009
app pub date -
Oct 9, 2008
filing date -
Aug 11, 2008
priority date (Note) -
Abandoned
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Abstract
The invention provides high definition litho appliqué and emblems manufactured from appropriate fabric, such as 100% polyester twill or micro fiber material, which has been sublimated with a high definition photograph-quality print. The high definition litho appliqué and emblems are cut into the desired shape and optional affixed to a garment. The invention further provides processes for producing the same.
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