SOLUTION BASED LANTHANUM PRECURSORS FOR ATOMIC LAYER DEPOSITION

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United States of America Patent

APP PUB NO 20090117274A1
SERIAL NO

12261169

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Alkyl cyclopentadienyl precursors for use in ALD processes are disclosed. The present invention particularly relates to La alkyl cyclopentadienyl precursors, such as tris(isopropyl-cyclopentadienyl) Lanthanum.

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Patent Owner(s)

Patent OwnerAddress
LINDE NORTH AMERICA INC575 MOUNTAIN AVENUE INTELLECTUAL PROPERTY DEPARTMENT MURRAY HILL NJ 07974

International Classification(s)

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  • 2008 Application Filing Year
  • C23C Class
  • 1299 Applications Filed
  • 709 Patents Issued To-Date
  • 54.59 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances2008200920102011201220132014201520162017201820192020202120220255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Kee-Chan Carlsbad, US 16 28
Ma, Ce San Diego, US 32 963
McFarlane, Graham Anthony Carlsbad, US 4 14

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Patent Citation Ranking

  • 7 Citation Count
  • C23C Class
  • 3.40 % this patent is cited more than
  • 16 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges2026611773372519115311201 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +020406080100120140160180200220240260280

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