Apparatus and Method for Wafer Edge Defects Detection

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United States of America Patent

SERIAL NO

12188849

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Abstract

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A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system a image processor to automatically detect and characterize defects on the wafer's edge.

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Patent Owner(s)

Patent OwnerAddress
ACCRETECH USA INC2600 TELEGRAPH ROAD SUITE 180 BLOOMFIELD HILLS MI 48302

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Forderhase, Paul F Austin , US 20 1088
Huang, Zhiyan Austin , US 4 100
Jin, Ju Austin , US 20 151
Lin, Siming Austin , US 9 604
Robbins, Michael D Round Rock , US 20 227
Sadam, Satish Round Rock , US 22 140
Verma, Vishal St. Joseph , US 50 970

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