Novel Photosensitive Resin Compositions

United States of America Patent

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Issued Date
Apr 30, 2009
app pub date
Oct 15, 2008
filing date
Oct 16, 2007

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Abstract

This disclosure relates to compositions that include (a) at least one polybenzoxazole precursor polymer; and (b) at least one silicon-containing polymer comprising a moiety of Structure (V):are defined in the specification.

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Patent Owner	Address
FUJIFILM ELECTRONIC MATERIALS U S A INC	80 CIRCUIT DRIVE NORTH KINGSTOWN RI 02852

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Inventor Name	Address	# of filed Patents	Total Citations
Naiini, Ahmad A	East Greenwich, US	36	254
Weber, William	East Providence, US	20	516

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Novel Photosensitive Resin Compositions

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United States of America Patent

12252203

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APP PUB NO	20090111050A1
SERIAL NO	12252203
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12252203

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