X-RAY MULTILAYER FILMS AND SMOOTHING LAYERS FOR X-RAY OPTICS HAVING IMPROVED STRESS AND ROUGHNESS PROPERTIES AND METHOD OF MAKING SAME
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Apr 23, 2009
app pub date -
Aug 11, 2008
filing date -
Aug 16, 2007
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
X-ray reflective multilayer films with greatly reduced surface roughness and film stress, and smoothing layers for reducing surface roughness of X-ray reflective film substrates, are produced by reactive sputter deposition using a sputter gas having nitrogen in combination with at least one inert gas. The nitrogen is incorporated into the film in a non-stoichiometric manner. Preferably, a gas fraction of the nitrogen is between approximately 5% and approximately 25%. The inert gas is preferably argon. In one embodiment, the materials to be reactively sputtered may include tungsten and boron carbide in alternating layers of the multilayer film. Alternatively, nickel and boron carbide or cobalt and carbon may be used in alternating layers of the multilayer film. Boron carbide may serve as the material for the smoothing layer.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully