DETECTION OF CONTAMINATION IN EUV SYSTEMS
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United States of America Patent
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Issued Date -
Apr 23, 2009
app pub date -
Sep 23, 2008
filing date -
Oct 23, 2007
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Abandoned
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Abstract
A sensor for sensing contamination in an application system is disclosed. In one aspect, the sensor comprises a capping layer. The sensor is adapted to cause a first reflectivity change upon initial formation of a first contamination layer on the capping layer when the sensor is provided in the system. The first reflectivity change is larger than an average reflectivity change upon formation of a thicker contamination layer on the capping layer and larger than an average reflectivity change upon formation of an equal contamination on the actual mirrors of the optics of the system.
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