Cleaning apparatus, cleaning system using cleaning apparatus, cleaning method of substrate-to-be-cleaned
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United States of America Patent
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Issued Date -
Apr 2, 2009
app pub date -
Dec 14, 2005
filing date -
Dec 14, 2004
priority date (Note) -
Abandoned
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Abstract
[Object] It is an object of the invention to provide a cleaning apparatus for cleaning a precision substrate capable of preventing a contamination factor from adhering again, to prevent a natural oxide film from being formed, and to prevent a water mark. can measure at any timing, and can detect one or more of a flammable component, a combustible component and a oxdizer component.
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