THIN-FILM MULTILAYER STRUCTURE, COMPONENT COMPRISING SAID STRUCTURE AND ITS METHOD OF DEPOSITION
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United States of America Patent
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Issued Date -
Mar 26, 2009
app pub date -
Jan 30, 2007
filing date -
Jan 30, 2006
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Abandoned
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Abstract
The invention relates to a corrosion-resistant thin-film multilayer structure having a low wear rate and a low coefficient of friction, comprising 1 to 1000 periods, one period comprising 2 to 100 layers (A, B) based on carbon, silicon and hydrogen, and optionally a functional surface layer (FSL). The invention also relates to a component comprising the thin-film multilayer structure and to its method of deposition.
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