AlxInyGa1-x-yN MIXTURE CRYSTAL SUBSTRATE, METHOD OF GROWING AlxInyGa1-x-yN MIXTURE CRYSTAL SUBSTRATE AND METHOD OF PRODUCING AlxInyGa1-x-yN MIXTURE CRYSTAL SUBSTRATE

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United States of America Patent

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12273250

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Abstract

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N crystal on a facet-growth condition, forming repetitions of parallel facet hills and facet valleys rooted upon the mask stripes, maintaining the facet hills and facet valleys, producing voluminous defect accumulating regions (H) accompanying the valleys, yielding low dislocation single crystal regions (Z) following the facets, making C-plane growth regions (Y) following flat tops between the facets, gathering dislocations on the facets into the valleys by the action of the growing facets, reducing dislocations in the low dislocation single crystal regions (Z) and the C-plane growth regions (Y), and accumulating the dislocations in cores (S) or interfaces (K) of the voluminous defect accumulating regions (H).

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Patent Owner(s)

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SUMITOMO ELECTRONIC INDUSTRIES LTDOSAKA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HIROTA, Ryu Itami-shi, JP 47 1229
MOTOKI, Kensaku Itami-shi, JP 80 2623
NAKAHATA, Seiji Itami-shi , JP 125 2579
OKAHISA, Takuji Itami-shi, JP 62 2509
UEMATSU, Koji Itami-shi, JP 87 2071

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