Arrangement and method for improving the measurement accuracy in the nm range for optical systems
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United States of America Patent
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Issued Date -
Mar 12, 2009
app pub date -
May 20, 2008
filing date -
May 21, 2007
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Abandoned
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Abstract
A method and a device for improving the measurement accuracy in the nm range for optical systems are disclosed. The object is provided with a plurality of structures oriented in the X and Y-coordinate direction. The light beam coming from at least one light source defines an optical illumination path.
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