FILTERED CATHODIC ARC DEPOSITION WITH ION-SPECIES-SELECTIVE BIAS
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United States of America Patent
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Issued Date -
Mar 12, 2009
app pub date -
Sep 5, 2008
filing date -
Sep 7, 2007
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Abandoned
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Abstract
ratio can be adjusted. It is shown that the resistivity of the film can be tuned by this species-selective bias. The principle can be extended to multiple-material plasma sources and complex materials.
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