Polymer compound, positive resist composition and method of forming resist pattern
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United States of America Patent
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Jun 29, 2010
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Mar 5, 2009
app pub date -
Aug 26, 2008
filing date -
Sep 4, 2007
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Abstract
A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0).represents an acid dissociable, dissolution inhibiting group]
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