LINE EDGE ROUGHNESS CONTROL
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United States of America Patent
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Issued Date -
Mar 5, 2009
app pub date -
Aug 27, 2007
filing date -
Aug 27, 2007
priority date (Note) -
Abandoned
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Abstract
at a ratio between about 2.5:1 and about 5.0:1 into the chamber, applying RF power to the electrode between about 300 W and about 500 W to form a plasma from the gases, and etching the dielectric layer with the plasma through the patterned photoresist.
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