Photoresist compositions

United States of America Patent

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Aug 28, 2012
Grant Date
Feb 26, 2009
app pub date
Aug 24, 2007
filing date
Aug 24, 2007

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Photoresist compositions are disclosed.

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Patent Owner	Address
MERCK PATENT GMBH	GERMANY

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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[Patents Count]

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Inventor Name	Address	# of filed Patents	Total Citations
Chakrapani, Srinivasan	Bridgewater, US	22	338
Kudo, Takanori	Bedminster, US	41	577
Padmanaban, Munirathna	Bridgewater, US	55	936
Rentkiewicz, David L	North Brunswick, US	3	14
Thiyagarajan, Muthiah	Bridgewater, US	13	97

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Photoresist compositions

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United States of America Patent

11844589

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PATENT NO	8252503
APP PUB NO	20090053652A1
SERIAL NO	11844589
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 28, 2012	US,8252503,B2 US8252503B2	GRANTED PATENT AS SECOND PUBLICATION
February 26, 2009	US,20090053652,A1 US20090053652A1	FIRST PUBLISHED PATENT APPLICATION

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11844589

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