MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM AND METHOD FOR MANUFACTURING A DEVICE
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United States of America Patent
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Issued Date -
Feb 26, 2009
app pub date -
Sep 18, 2008
filing date -
Apr 7, 2006
priority date (Note) -
Abandoned
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Abstract
In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This optical system can have an object-image shift (OIS) of about 75 mm or less. Metrology and testing can be easily implemented despite rotations of the optical system about a rotation axis. Such a catoptric microlithgraphy projection optical system can be implemented in a microlithography tool. Such a microlithography tool can be used to produce microstructured components.
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