METHOD FOR DETERMINING THE POSITION OF A MEASUREMENT OBJECTIVE IN THE Z-COORDINATE DIRECTION OF AN OPTICAL MEASURING MACHINE HAVING MAXIMUM REPRODUCIBILITY OF MEASURED STRUCTURE WIDTHS

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United States of America Patent

APP PUB NO 20090051932A1
SERIAL NO

12193095

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Abstract

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A method for determining the ideal focus position on different substrates is disclosed. A focus criterion is determined with which the best reproducibility may be achieved. An offset permits the user to set the optimal operating point of the coordinate measuring machine for a reproducible measurement of dimensions of structures on a substrate.

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Patent Owner(s)

Patent OwnerAddress
VISTEC SEMICONDUCTOR SYSTEMS GMBH35781 WEILBURG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Heiden, Michael Wolfersheim, DE 37 149
Rinn, Klaus Heuchelheim, DE 23 258

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