SUBSTRATE PROCESSING APPARATUS AND METHOD
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United States of America Patent
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Issued Date -
Feb 19, 2009
app pub date -
Jun 26, 2008
filing date -
Aug 13, 2007
priority date (Note) -
Abandoned
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Abstract
A substrate processing apparatus includes a first chamber, a second chamber provided adjacent the first chamber to form a process space therebetween, a support unit supporting the second chamber with a gap between the first and second chambers, and a vacuum unit to place the process space in a vacuum state, the process spaced sealed in the vacuum state.
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