Method and System for Automated Inspection System Characterization and Monitoring
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United States of America Patent
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Issued Date -
Feb 19, 2009
app pub date -
Aug 16, 2007
filing date -
Aug 16, 2007
priority date (Note) -
Abandoned
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Abstract
A method and system characterizing and monitoring an automated inspection system are provided. A method for automatically characterizing an automatic inspection system for photomasks may include removing portions of an optical attenuator layer disposed on a substrate in order to expose portions of the substrate and create a plurality of test features. The may further include forming a plurality of programmed defects, on the optical attenuator layer, the plurality of programmed defects comprising at least one of an optical reflector and an optical absorber.
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