PHOTOMASK DEFECT CORRECTION DEVICE AND PHOTOMASK DEFECT CORRECTION METHOD
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United States of America Patent
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Issued Date -
Feb 12, 2009
app pub date -
Jun 25, 2008
filing date -
Jun 25, 2007
priority date (Note) -
Abandoned
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Abstract
Provided is a photomask defect correction method including: an observing step of scanning plurality of lines one after another while controlling a distance between the probe tip and a surface (2a) of the substrate so that displacement of the probe becomes constant to recognize a shape of the defect portion (5) through AFM observation; and a processing step of scanning a plurality of lines one after another while pressing the probe tip to the recognized defect portion with a predetermined force to subject the defect portion to cutting and removing processing, in which, at the observing step, the scanning for every one line is set in a parallel direction (C direction) to an edge (3a) of a mask pattern (3), and the scanning of the plurality of lines is performed one after another from the mask pattern side towards a tip side (D direction) of the defect portion.
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