NON-FLAMMABLE SOLVENTS FOR SEMICONDUCTOR APPLICATIONS
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United States of America Patent
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Issued Date -
Jan 22, 2009
app pub date -
Jun 9, 2008
filing date -
Jun 7, 2007
priority date (Note) -
Abandoned
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Abstract
Methods and compositions for purging and cleaning a semiconductor fabrication system are disclosed herein. In general, the disclosed methods utilize solvents comprising hydrofluoroethers. Hydrofluoroethers are non-toxic and have low moisture content, preventing heat generation from organometallic precursor hydrolysis. In an embodiment, a method of cleaning a semiconductor fabrication system comprises dissolving at least one chemical precursor used in semiconductor fabrication in at least one delivery line with a solvent to clean the at least one delivery line. The solvent generally comprises a hydrofluoroether. The methods and compositions may be used in a variety of semiconductor film deposition processes.
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