ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
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United States of America Patent
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app pub date -
Sep 18, 2008
filing date -
May 5, 1998
priority date (Note) -
Abandoned
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Abstract
There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.
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