Resist composition and method for forming resist pattern
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United States of America Patent
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Sep 1, 2009
Grant Date -
Jan 1, 2009
app pub date -
Aug 19, 2005
filing date -
Sep 13, 2004
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Abstract
A resist composition is obtained by dissolving a resin component (A) that exhibits changed alkali solubility under the action of acid, an oxime sulfonate-based acid generator (B), an amine compound (D) containing at least one alkyl group of 5 to 12 carbon atoms, and an organic acid (E), in an organic solvent (C) containing methyl n-amyl ketone, wherein the component (E) is a dibasic acid.
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