Novel Photosensitive Resin Compositions
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United States of America Patent
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app pub date -
Aug 21, 2008
filing date -
Oct 15, 2003
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Abstract
A positive-working photosensitive composition containing one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate.
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