Method and System for Cooling a Bake Plate in a Track Lithography Tool
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United States of America Patent
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Issued Date -
Jan 1, 2009
app pub date -
Jun 28, 2007
filing date -
Jun 28, 2007
priority date (Note) -
Abandoned
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Abstract
A bake station includes a bake plate having a thickness defined by a distance between an upper surface and a lower surface of the bake plate. The bake plate is configured to heat a substrate positioned adjacent the upper surface of the bake plate. The bake station also includes a base plate having a first surface positioned below and opposing the lower surface of the bake plate and a side plate extending between the lower surface of the bake plate and the first surface of the base plate. The side plate, the lower surface of the bake plate, and the first surface of the base plate define a space. The bake station further includes a plurality of nozzles coupled to the base plate. Each of the plurality of nozzles has an inlet configured to receive an input flow of fluid and an exit port configured to expel an exit flow of fluid onto the lower surface of the bake plate. Additionally, the bake station includes an exhaust port in fluid communication with the space and configured to exhaust the exit flow of fluid from the space.
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