METHOD FOR MEASURING THICKNESS AND MEASURING DEVICE USING THE SAME
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United States of America Patent
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Issued Date -
Dec 25, 2008
app pub date -
Oct 29, 2007
filing date -
Jun 22, 2007
priority date (Note) -
Abandoned
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Abstract
A method for measuring thickness of a transparent layer and a measuring device using the same are provided. The transparent layer has a first face, a second face and a normal direction. The method includes the following steps. First, a light beam with a focal point is emitted to the transparent layer. Next, a focus error signal (FES) is generated according to a refracted beam of the light beam. Then, the focal point is moved along the normal direction and passes through the first face and the second face. The FES converts into a first focus error curve and a second focus error curve respectively when the focal point passes through the first and the second face. Afterwards, the thickness of the transparent layer is obtained according to the first focus error curve and the second focus error curve.
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