Ion Implanter Operating in Pulsed Plasma Mode
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United States of America Patent
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Issued Date -
Dec 25, 2008
app pub date -
Jun 14, 2005
filing date -
Jun 16, 2004
priority date (Note) -
Abandoned
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Abstract
The present invention relates to an ion implanter IMP comprising a pulsed plasma source SPL, a substrate-carrier tray PPS, and a power supply ALT for the tray. The implanter also includes a capacitor C connected directly to ground E and connected downstream from the tray power supply ALT. The invention also provides a method of using the implanter.
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