Methods of Making Molybdenium Titanium Sputtering Plates and Targets
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United States of America Patent
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Issued Date -
Dec 25, 2008
app pub date -
Oct 16, 2006
filing date -
Oct 20, 2005
priority date (Note) -
Abandoned
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Abstract
Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the .beta.(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase .beta.(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.
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