PRETREATMENT COMPOSITIONS
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United States of America Patent
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app pub date -
Jun 10, 2008
filing date -
Jun 3, 2005
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Abandoned
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Abstract
A pretreatment composition of: (a) at least one compound having structure VI V.sup.1--Y--V.sup.2 VI in which each of Y, V.sup.1, and V.sup.2 is defined in the specification; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter;in which the amount of the compound of Structure VI present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.
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