LITHOGRAPHY MATERIAL AND LITHOGRAPHY PROCESS
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United States of America Patent
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Issued Date -
Dec 4, 2008
app pub date -
Jul 26, 2007
filing date -
May 31, 2007
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Abstract
An immersion lithography resist material comprising a matrix polymer having a first polarity and an additive having a second polarity that is substantially greater than the first polarity. The additive may have a molecular weight that is less than about 1000 Dalton. The immersion lithography resist material may have a contact angle that is substantially greater than the contact angle of the matrix polymer.
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