METHOD AND APPARATUS OF WAFER SURFACE POTENTIAL REGULATION
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United States of America Patent
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Issued Date -
Dec 4, 2008
app pub date -
May 30, 2007
filing date -
May 30, 2007
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Abandoned
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Abstract
An electron beam apparatus and method are presented for regulating wafer surface potential during e-beam (scanning electron microscopy SEM) inspection and review. Regulating surface potential is often critical to detect voltage contrast (VC) defects of specific type, and sometimes, its also an important factor to achieve high quality SEM images.
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